The effects of dental adhesives total etch; self-etch and selective etch application procedures on microleakage in class II composite restorations

Purpose: The aim of this study is to evaluate the amount of microleakage resulting from the application of self-etch, selective etch, etch-and-rinse of adhesive systems in class II cavities.

Materials and methods: Four adhesive systems with etch-and-rinse, selective etch and self etch methods were used on the extracted teeth. All groups were restored with G-aenial A'CHORD (Nanohybrid) (GC, Tokyo, Japan) A2 composite. After 1000 thermal cycles were applied to the teeth after restoration, the samples were kept in 0.5% basic fuchsin for 24 hours. Microleakage values formed after dye penetration with basic fuchsin were determined quantitatively by scoring method on sections taken from each sample in the mesiodistal direction. One-way Analysis of Variance (ANOVA) and Tukey test were used for statistical analysis of the data (p<0.05).

Results: While there was no statistically significant difference between the etch-and-rinse and selective etch applications of adhesive systems (G2-Bond Universal, Clearfil Tri-S Bond Universal Prime&Bond Universal and Tokuyama Bond Force II) (p>0.05), there was a statistically significant difference in self-etch application (p<0.05). As a result of Prime&Bond Universal's self-etch application, it showed statistically more microleakage than the other three adhesive systems (p<0.05).

Conclusion: It has been observed that additional etching of enamel and/or dentin with phosphoric acid reduces the amount of microleakage.